13761090949
當(dāng)前位置：首頁 > 產(chǎn)品中心 > 二維材料 > 六方氮化硼 > 基于285nm二氧化硅基底的單層氮化硼薄膜
簡要描述：Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates （p-doped）, 1cmx1cm: 4 packProperties of BN film97% coverage with minor holes and organic residuesHigh Crystalline Quality
產(chǎn)品型號： 廠商性質(zhì)：生產(chǎn)廠家更新時間：2026-04-09訪 問 量：1818詳細(xì)介紹
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates (p-doped), 1cmx1cm: 4 pack
Properties of BN film
97% coverage with minor holes and organic residues
High Crystalline Quality
The Raman spectrum should peak at ~1369cm-1
產(chǎn)品咨詢
聯(lián)系我們
上海巨納科技有限公司 公司地址：上海市虹口區(qū)寶山路778號海倫國際大廈5樓 技術(shù)支持：化工儀器網(wǎng)掃一掃 更多精彩
微信二維碼
網(wǎng)站二維碼
歡迎來到