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Multilayer h-BN （Boron Nitride） film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

Single layer h-BN （Boron Nitride） monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.

This product contains small crystallites of h-BN layered flakes that can be used for conventional exfoliation process as well as liquid phase h-BN solution manufacturing.

Our h-BN crystals reach at most to 2mm in size and are considered as gold standard in 2D materials field.

Single Layer CVD hexagonal Boron Nitride Film on 285 nm SiO2/Si substrates （p-doped）, 1cmx1cm: 4 pack Properties of BN film 97% coverage with minor holes and organic residues High Crystalline Quality

Single layer h-BN （Boron Nitride） film grown in copper foil. h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2 bonds in the plane, the in-plane mechanical strength